Silicon Chip Reduced ...Again?
World seems to be getting along for tapping computing power in minimum space. Moreover there have been recent successful attempts of the technology being funded to achieve breakthroughs. Although the ways of these individual efforts may be different, the final objective is the same. University of Utah has developed a similar kind of breakthrough which promises us advanced computers soon.
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Image Credit: CNET
The research is based on earlier studies and it looks to be an extension of Optical Lithography. Postdoc Trisha Andrew PhD ’10 of MIT’s Research Laboratory of Electronics and her team have added a new step in the earlier approaches of increasing the capacity of smaller Silicon chip. Along with the previous processes involving interference of light, a new concept called Photoresist can be seen. A Photoresist will be used to produce a pattern on the chip. Basically when the light will fall on the photoresist it will imprint certain designs on the Silicon chip which will be etched away from it with certain chemical processes. The chemical used is called developer. In this way, it appears to be cheaper alternative to the earlier methods.
Of course #-Link-Snipped-# is better explained in the paper published in #-Link-Snipped-# titled 'Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules'. What is more interesting to note is the success that this chip will be able to once #-Link-Snipped-#.
As per records of commercial success, IBM can be no second but technology keeps on improving and there cannot be a 'NO' that the one developed by the expertise of the University will be anything less. However to me, it appears to be only an advanced version of the present generation chip. We need some #-Link-Snipped-# which is touted to be a next generation technology. In which the recent achievement by Bristol researchers is a huge leap in this field. Let us see which prevails!
#-Link-Snipped-#
Image Credit: CNET
The research is based on earlier studies and it looks to be an extension of Optical Lithography. Postdoc Trisha Andrew PhD ’10 of MIT’s Research Laboratory of Electronics and her team have added a new step in the earlier approaches of increasing the capacity of smaller Silicon chip. Along with the previous processes involving interference of light, a new concept called Photoresist can be seen. A Photoresist will be used to produce a pattern on the chip. Basically when the light will fall on the photoresist it will imprint certain designs on the Silicon chip which will be etched away from it with certain chemical processes. The chemical used is called developer. In this way, it appears to be cheaper alternative to the earlier methods.
Of course #-Link-Snipped-# is better explained in the paper published in #-Link-Snipped-# titled 'Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules'. What is more interesting to note is the success that this chip will be able to once #-Link-Snipped-#.
As per records of commercial success, IBM can be no second but technology keeps on improving and there cannot be a 'NO' that the one developed by the expertise of the University will be anything less. However to me, it appears to be only an advanced version of the present generation chip. We need some #-Link-Snipped-# which is touted to be a next generation technology. In which the recent achievement by Bristol researchers is a huge leap in this field. Let us see which prevails!
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