Holographic Patterning Of 3D Microbatteries For On-Chip Integration With Microscale Devices

The micro-scale devices such as sensors, monitors, diminutive implantable medical systems, autonomous microscopic actuators, wireless communication devices, et al conventionally consume power supplied by off-chip batteries because it is not at all easy to miniaturize energy storage technologies. But recently, the researchers from the University of Illinois at Urbana-Champaign have holographically patterned a 3D lithium-ion microbattery that can be integrated on-chip with microelectronic devices. This was devised by combining effective 3D holographic lithography and 2D photolithography techniques. According to the researchers, the small-scaled 3D battery not only delivers high performance but also has exceptional scalability.

3D-lithium-ion-microbattery
3D electrode designs can generate more power and energy per unit area. However, owing to the design complexity of 3D electrodes, the on-chip integration and scaling of the batteries was difficult. In this study, the researchers developed the method for making high-performance microbatteries by employing the processes that are extremely compatible with the fabrication of microelectronics. In order to define the interior structure of electrodes, the team resorted to 3D holographic lithography. And, for creating the desired electrode shape, it made use 2D photolithography because the structural parameters of the electrodes such as size, shape, surface area, porosity, and tortuosity can be controlled and revamped during this process. This will help the researchers to create next-generation on-chip energy storage devices.

holographically-patterned-3D-electrodes

In 3D holographic patterning technique, the multiple optical beams that are interfering inside the photoresist create a desired structure of porous electrodes that helps the battery to achieve supercapacitor-like power as the electrons and ions inside it move rapidly. According to John Rogers, a professor of materials science and engineering, the construction of 3D holographic lithography requires accurate and precise control on the interfering optical beams. However, due to the recent advances the structures can be developed by using an individual incident beam and standard photoresist processing.

An article on the research was published in the Proceedings of the National Academy of Sciences (PNAS) Journal.

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